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Thermodynamical Analyses of Chemical Vapor Deposition of P3N5 Thin Films

dc.contributor.authorGallois, Bernard
dc.contributor.authorEROĞLU, ŞERAFETTİN
dc.date.accessioned2021-03-02T23:08:42Z
dc.date.available2021-03-02T23:08:42Z
dc.identifier.citationEROĞLU Ş., Gallois B., "Thermodynamical Analyses of Chemical Vapor Deposition of P3N5 Thin Films", JOURNAL DE PHYSIQUE IV, cilt.C5, ss.79-86, 1995
dc.identifier.issn1155-4339
dc.identifier.othervv_1032021
dc.identifier.otherav_10b5ff38-ede2-49eb-bed1-7a1b47a77108
dc.identifier.urihttp://hdl.handle.net/20.500.12627/16730
dc.language.isoeng
dc.subjectMühendislik ve Teknoloji
dc.subjectMetalurji ve Malzeme Mühendisliği
dc.subjectMalzeme Bilimi
dc.subjectMühendislik, Bilişim ve Teknoloji (ENG)
dc.titleThermodynamical Analyses of Chemical Vapor Deposition of P3N5 Thin Films
dc.typeMakale
dc.relation.journalJOURNAL DE PHYSIQUE IV
dc.contributor.department, ,
dc.identifier.volumeC5
dc.identifier.startpage79
dc.identifier.endpage86
dc.contributor.firstauthorID339846


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