Nanodot Exposure in Different size With Using Electron Beam Lithography

dc.contributor.author	Çalışkan, Murat
dc.contributor.author	KURUOĞLU, Furkan
dc.contributor.author	Serin, Merih
dc.contributor.author	EROL, Ayşe
dc.contributor.author	Yavuzçetin, Özgür
dc.date.accessioned	2021-03-03T14:53:09Z
dc.date.available	2021-03-03T14:53:09Z
dc.identifier.citation	KURUOĞLU F., Yavuzçetin Ö., EROL A., Çalışkan M., Serin M., "Nanodot Exposure in Different size With Using Electron Beam Lithography", Turkish Physical Society 32nd International Physics Congrees, Muğla, Türkiye, 6 - 09 Eylül 2016, ss.1
dc.identifier.other	vv_1032021
dc.identifier.other	av_3bf8c29e-bab2-4549-906d-9b58d3bbffe9
dc.identifier.uri	http://hdl.handle.net/20.500.12627/44258
dc.language.iso	eng
dc.subject	Temel Bilimler
dc.subject	Fizik
dc.subject	Temel Bilimler (SCI)
dc.title	Nanodot Exposure in Different size With Using Electron Beam Lithography
dc.type	Bildiri
dc.contributor.department	, ,
dc.contributor.firstauthorID	451365

Files in this item

Files	Size	Format	View
There are no files associated with this item.