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dc.contributor.authorFRANCIOSI, A
dc.contributor.authorYILDIRIM, Saffettin
dc.contributor.authorBIASIOL, G
dc.contributor.authorMILLER, TJ
dc.contributor.authorNATHAN, MI
dc.contributor.authorCANTILE, M
dc.contributor.authorSORBA, L
dc.contributor.authorFARACI, P
dc.date.accessioned2021-03-03T20:27:42Z
dc.date.available2021-03-03T20:27:42Z
dc.date.issued1994
dc.identifier.citationCANTILE M., SORBA L., YILDIRIM S., FARACI P., BIASIOL G., FRANCIOSI A., MILLER T., NATHAN M., "SILICON-INDUCED LOCAL INTERFACE DIPOLE IN AL GAAS(001) SCHOTTKY DIODES", APPLIED PHYSICS LETTERS, cilt.64, sa.8, ss.988-990, 1994
dc.identifier.issn0003-6951
dc.identifier.otherav_5a0e5490-44bd-4a17-b028-9322260f0d62
dc.identifier.othervv_1032021
dc.identifier.urihttp://hdl.handle.net/20.500.12627/63312
dc.identifier.urihttps://doi.org/10.1063/1.110927
dc.description.abstractAl/Si/GaAs(001) diode structures grown by molecular beam epitaxy were examined as a function of the thickness of the Si interface layer and the intensity of the As or Al flux employed during Si deposition. We found that Schottky barriers as low as 0.3-0.4 eV (in the presence of a sufficiently high As flux) or as high as 1.0-1.1 eV (in the presence of a sufficiently high Al flux) can be established on n-type GaAs at Si coverages in the submonolayer to monolayer range. We therefore associate the tunability of the barrier height with a Si-induced local interface dipole.
dc.language.isoeng
dc.subjectFizik
dc.subjectTemel Bilimler
dc.subjectFİZİK, UYGULAMALI
dc.subjectTemel Bilimler (SCI)
dc.titleSILICON-INDUCED LOCAL INTERFACE DIPOLE IN AL GAAS(001) SCHOTTKY DIODES
dc.typeMakale
dc.relation.journalAPPLIED PHYSICS LETTERS
dc.contributor.department, ,
dc.identifier.volume64
dc.identifier.issue8
dc.identifier.startpage988
dc.identifier.endpage990
dc.contributor.firstauthorID2182173


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