Show simple item record

dc.contributor.authorShah, S. Ismat
dc.contributor.authorCan, Musa Mutlu
dc.contributor.authorFirat, Tezer
dc.date.accessioned2021-03-04T14:31:08Z
dc.date.available2021-03-04T14:31:08Z
dc.identifier.citationCan M. M. , Shah S. I. , Firat T., "The formation of anomalous Hall effect depending on W atoms in ZnO thin films", APPLIED SURFACE SCIENCE, cilt.303, ss.76-83, 2014
dc.identifier.issn0169-4332
dc.identifier.othervv_1032021
dc.identifier.otherav_8206bbd4-82d9-439b-8940-baf72a0c2067
dc.identifier.urihttp://hdl.handle.net/20.500.12627/88566
dc.identifier.urihttps://doi.org/10.1016/j.apsusc.2014.02.079
dc.description.abstractarticle investigates the effects of intrinsic point defects and extrinsic W atoms on magneto electrical properties in the ZnO lattice. The analyses were accomplished for similar to 0.5% W including ZnO thin films, grown using a radio frequency (RF) magnetron sputtering system. The polarized spin current dependent magnetic formation was investigated by longitudinal and transverse magneto electrical measurements in a temperature range of 5 K to 300 K. The positive magneto resistivity (PMR) ratios reached 28.8%, 12.7%, and 17.6% at 5 K for thin films, having different post-deposition annealing conditions as a consequence of ionic W dependent defects in the lattice. Furthermore, an anomalous Hall effect, originating from polarized spin currents, was understood from the split in Hall resistance versus magnetic field (R-xy(H)) curves for the thin film with high amount of Zn2+ and W6+ ionic defects. (C) 2014 Elsevier B.V. All rights reserved.
dc.language.isoeng
dc.subjectFizik
dc.subjectFİZİK, YOĞUN MADDE
dc.subjectYoğun Madde 1:Yapısal, Mekanik ve Termal Özellikler
dc.subjectFizikokimya
dc.subjectTemel Bilimler
dc.subjectMühendislik ve Teknoloji
dc.subjectMühendislik, Bilişim ve Teknoloji (ENG)
dc.subjectFİZİK, UYGULAMALI
dc.subjectMalzeme Bilimi
dc.subjectMALZEME BİLİMİ, KAPLAMALAR VE FİLMLER
dc.subjectTemel Bilimler (SCI)
dc.subjectKimya
dc.subjectKİMYA, FİZİKSEL
dc.titleThe formation of anomalous Hall effect depending on W atoms in ZnO thin films
dc.typeMakale
dc.relation.journalAPPLIED SURFACE SCIENCE
dc.contributor.departmentUniversity Of Delaware , ,
dc.identifier.volume303
dc.identifier.startpage76
dc.identifier.endpage83
dc.contributor.firstauthorID94345


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following Collection(s)

Show simple item record