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dc.contributor.authorGallois, Bernard
dc.contributor.authorEROĞLU, ŞERAFETTİN
dc.date.accessioned2021-03-04T14:50:23Z
dc.date.available2021-03-04T14:50:23Z
dc.identifier.citationEROĞLU Ş., Gallois B., "TEXTURE ANALYSES OF CHEMICALLY VAPOR-DEPOSITED COATINGS IN THE TI-C-N SYSTEM BY WIDE FILM DEBYE-SCHERRER X-RAY-DIFFRACTION TECHNIQUE", JOURNAL DE PHYSIQUE IV, cilt.3, ss.177-182, 1993
dc.identifier.issn1155-4339
dc.identifier.othervv_1032021
dc.identifier.otherav_8395c7ef-c59e-49d5-ab54-2f6cfe62631e
dc.identifier.urihttp://hdl.handle.net/20.500.12627/89560
dc.identifier.urihttps://doi.org/10.1051/jp4:1993322
dc.description.abstractTexture analyses were performed on the chemically vapor deposited monolithic TiN, TiC, TiC(x)N(y) coatings and graded TiN/TiC coatings by wide film Debye-Scherrer X-ray diffraction technique. The preferred orientations of the coatings were investigated as a function of coating thickness and input gas composition. The growth of TiN and TiC coatings was initiated as randomly oriented crystallites which subsequently grew into large columnar grains with a [110] preferred orientation. The textures of TiC coatings with the same thickness changed from the [110] orientation to the [100] orientation with decreasing hydrogen concentration in the gas phase. TiC(x)N(y) coatings exhibited a preferred orientation of [111] up to the CH4/CH4+N2 ratio of 0.14 above which a strong [100] texture developed. The texture analyses on the graded TiN/TiC coatings showed that the TiC top layers were oriented in a [100] direction perpendicular to the sample surface.
dc.language.isoeng
dc.subjectFİZİK, MULTİDİSİPLİNER
dc.subjectTemel Bilimler
dc.subjectDisiplinlerarası Fizik ve İlgili Bilim ve Teknoloji Alanları
dc.subjectTemel Bilimler (SCI)
dc.subjectFizik
dc.titleTEXTURE ANALYSES OF CHEMICALLY VAPOR-DEPOSITED COATINGS IN THE TI-C-N SYSTEM BY WIDE FILM DEBYE-SCHERRER X-RAY-DIFFRACTION TECHNIQUE
dc.typeMakale
dc.relation.journalJOURNAL DE PHYSIQUE IV
dc.contributor.department, ,
dc.identifier.volume3
dc.identifier.startpage177
dc.identifier.endpage182
dc.contributor.firstauthorID339852


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